产品名称 | 2-(3,4-环氧环己基)乙基三甲氧基硅烷 |
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英文名称 | 2-(3,4-Epoxycyclohexyl)ethyltrimethoxysilane |
别名 | 三甲氧基[2-(7-氧杂二环[4.1.0]庚-3-基)乙基]硅烷;2-(7-氧杂二环[4.1.0]庚-3-基)乙基-三甲氧基硅烷;3-(2-三甲氧基硅基乙基)氧化环己烯;2-(3,4-环氧环己烷)乙基三甲氧基硅烷 |
英文别名 | Trimethoxy[2-(7-oxabicyclo[4.1.0]heptan-3-yl)ethyl]silane;Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane |
应用 | Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane was used as an adhesion promoter during the fabrication of: · a photoacid generator activated by two photon excitation. · nanoscale polymeric structures (width: 65 nm) using 520 nm femtosecond pulse excitation Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane may be used as a precursor to form SiCOH film via sol-gel. The silane may be used to functionalize alumina nanoparticles towards the fabrication of polyamide 12/alumina nanocomposites. 4 Basalt fibers were functionalized with this silane and its consequent effect on the fabrication of basalt fiber-epoxidized vegetable oil matrix composite materials was analyzed |
规格或纯度 | >97.0%(GC) |
运输条件 | 常规运输 |
Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane was used as an adhesion promoter during the fabrication of: · a photoacid generator activated by two photon excitation. · nanoscale polymeric structures (width: 65 nm) using 520 nm femtosecond pulse excitation Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane may be used as a precursor to form SiCOH film via sol-gel. The silane may be used to functionalize alumina nanoparticles towards the fabrication of polyamide 12/alumina nanocomposites. 4 Basalt fibers were functionalized with this silane and its consequent effect on the fabrication of basalt fiber-epoxidized vegetable oil matrix composite materials was analyzed
闪点(摄氏) | 141°C |
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闪点(华氏) | 141°C |
CAS编号 | 3388-04-3 |
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敏感性 | 对湿度敏感 |
折光率 | 1.4490 to 1.4530 |
沸点 | 310 °C |
储存温度 | 充氩 |
Reaxys-RN | 8980119 |
RTECS | VV4000000 |
MDL号 | MFCD00014485 |
密度 | 1.065 |
分子量 | 246.38 |
分子式 | C11H22O4Si |
品牌 | 阿拉丁 |